Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings Accelerators, Beams, and Instrumentations)
Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
კატეგორია:
წელი:
2006
გამოცემა:
1
გამომცემლობა:
American Inst. of Physics
ენა:
english
გვერდები:
645
ISBN 10:
0735403651
ISBN 13:
9780735403659
ფაილი:
PDF, 31.56 MB
IPFS:
,
english, 2006
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